haohan高纯一氧化碳气体中微量杂质二氧化碳的测定HayeSep Db填充柱9m*3mm内径

高纯气体在现代工业中具有重要的地位，其中高纯一氧化碳(co)是应用较为广泛的高纯气体之一，它主要用于半导体、芯片、平板、光刻、冶金等行业。在半导体制程中，一氧化碳与六氟化硫混合气可将基片上无光刻胶掩蔽的加工表面蚀刻掉，而使有光刻胶掩蔽的区域保存下来，以便在基片表面上获得所需要的成像图形；此外，电子特气一氧化碳也可为多晶硅外延层提供碳源生成聚合物侧壁保护膜，调节刻槽深宽比；与常用的氟碳类化合物、hbr等刻蚀气体相较，一氧化碳作为必不可少的刻蚀气体。
 

随着我国工业经济的迅猛发展，气体在工业及半导体生产中有着“血液”之称，高纯一氧化碳气体的生产与供应使得近几年来颁布了行业标准、国家标准，高纯气体中痕量杂质的检测以气相色谱方法为主。

 

色谱分析柱2：
名称：分离柱
固定相：高分子小球
规格：0.6m*3mm内径，0.25mm   ，分离二氧化碳

型号：HayeSep Db

应用：GBT 35995-2018 一氧化碳

High-purity gas plays an important role in modern industry. Among them, high-purity carbon monoxide (CO) is one of the most widely used high-purity gases. It is mainly used in semiconductor, chip, flat panel, lithography, metallurgy and other industries. In semiconductor manufacturing, a mixture of carbon monoxide and sulfur hexafluoride can etch away the processed surface on the substrate without photoresist masking, while leaving the photoresist masked area to be preserved, so as to obtain the desired surface on the substrate surface. Imaging patterns; in addition, the electronic special gas carbon monoxide can also provide a carbon source for the polysilicon epitaxial layer to generate a polymer sidewall protective film to adjust the aspect ratio of the groove; compared with commonly used fluorocarbons, hbr and other etching gases, carbon monoxide as an essential etching gas.


With the rapid development of my country's industrial economy, gas is known as "blood" in industry and semiconductor production. The production and supply of high-purity carbon monoxide gas has led to the promulgation of industry standards and national standards in recent years. Trace impurities in high-purity gas The detection is based on gas chromatography.



Chromatographic column 2:
Name: Separation Column
Stationary phase: polymer beads
Specifications: 9m*3mm inner diameter, 0.25mm, separation of carbon dioxide

Model: HayeSep Db

Application: GBT 35995-2018 Carbon monoxide