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    This standard specifies the technical requirements, test methods, packaging, marking, storage, transportation and safety of trifluoromethane for electronic industry.

    This standard is applicable to trifluoromethane products prepared with difluoromethane, trichloromethane and hydrogen fluoride as raw materials. It is used as etching gas in the plasma etching process of electronic industry.

    Molecular formula: CHF3



    Name: Filled Column



    Stationary phase: porous polymer



    Specification: 2m * 2MM (inner diameter)



    Model: PQ/Orapak Q



    Particle size: 60-80 mesh

    Application: determination of carbon dioxide and fluorocarbon compounds in trifluoromethane
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