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This standard specifies the technical requirements, test methods, packaging, marking, storage, transportation and safety of trifluoromethane for electronic industry.
This standard is applicable to trifluoromethane products prepared with difluoromethane, trichloromethane and hydrogen fluoride as raw materials. It is used as etching gas in the plasma etching process of electronic industry.
Molecular formula: CHF3
Name: Filled Column
Stationary phase: porous polymer
Specification: 2m * 2MM (inner diameter)
Model: PQ/Orapak Q
Particle size: 60-80 mesh
Application: determination of carbon dioxide and fluorocarbon compounds in trifluoromethane -
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